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IMEC has a long background in nonvolatile memories both of the floating gate and the charge trapping type. At the end of the 80s, a new embedded Flash technology (HIMOS?) which uses source-side hot-electron injection in split-gate devices was developed. In the 90s and 00s this technology was fully integrated in several technology generations, partially under the ESPRIT-APBB (1989-1994) and the MEDEA+ Crescendo programme (2001-2002). In recent years the activities on charge trapping memories for scaling beyond 32nm have been ramped up considerably. Currently, IMEC is involved in the IST-STREP project FinFLASH and the MEDEA+ programme Nemesys. |